Kemi offers cluster-type and batch-type chemical vapor deposition systems and additionally offers systems specially designed for development, ranging from PE-CVD systems essential for a-Si and passive film deposition to metal CVD and thermal CVD systems.
| Article | Description |
| Modèle | TFE – 1200 – 50 – 220 |
| Température de conception | 1150℃ (short-term) |
| Température nominale | 1100℃ |
| Taux de chauffage recommandé | ≤10℃/min |
| Control accuracy | ±1℃ |
| Tube size | Φ30/50/60*1200mm |
| Taille de la chambre | Φ80*220mm |
| Longueur de la zone de chauffage | 220mm |
| Longueur de la zone de température constante | 80mm |
| Élément chauffant | High-quality domestic resistance wire |
| Puissance nominale | 3KW |
| Gas supply system | Three ways of high-precision MFCs Range: 0 – 500 sccm (customizable) |
| Radio frequency power supply | Radio frequency power: 5 – 500W; Radio frequency: 13.56 MHz; Matching method: Automatic matching |
| Vacuum system | Two-stage rotary vane vacuum pump (customizable with diffusion pump, molecular pump, etc.) |
| Dimensions | 1250*510*810mm |
